Invention Grant
- Patent Title: Impedance controlled electrical interconnection employing meta-materials
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Application No.: US16685623Application Date: 2019-11-15
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Publication No.: US11456255B2Publication Date: 2022-09-27
- Inventor: Christopher Wyland
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L23/538
- IPC: H01L23/538 ; H01L23/00 ; H01P1/04 ; H05K1/02 ; H01L23/66 ; H01L23/522

Abstract:
A method of improving electrical interconnections between two electrical elements is made available by providing a meta-material overlay in conjunction with the electrical interconnection. The meta-material overlay is designed to make the electrical signal propagating via the electrical interconnection to act as though the permittivity and permeability of the dielectric medium within which the electrical interconnection is formed are different than the real component permittivity and permeability of the dielectric medium surrounding the electrical interconnection. In some instances the permittivity and permeability resulting from the meta-material cause the signal to propagate as if the permittivity and permeability have negative values. Accordingly the method provides for electrical interconnections possessing enhanced control and stability of impedance, reduced noise, and reduced loss. Alternative embodiments of the meta-material overlay provide, the enhancements for conventional discrete wire bonds whilst also facilitating single integrated designs compatible with tape implementation.
Public/Granted literature
- US20200083171A1 Impedance Controlled Electrical Interconnection Employing Meta-Materials Public/Granted day:2020-03-12
Information query
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