Invention Grant
- Patent Title: Semiconductor memory device, method of driving the same and method of fabricating the same
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Application No.: US17401601Application Date: 2021-08-13
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Publication No.: US11456297B2Publication Date: 2022-09-27
- Inventor: Jin Hong Ahn
- Applicant: SK hynix Inc. , Jin Hong Ahn , Duality Inc.
- Applicant Address: KR Gyeonggi-do; KR Gyeonggi-do; KR Daejeon
- Assignee: SK hynix Inc.,Jin Hong Ahn,Duality Inc.
- Current Assignee: SK hynix Inc.,Jin Hong Ahn,Duality Inc.
- Current Assignee Address: KR Gyeonggi-do; KR Gyeonggi-do; KR Daejeon
- Agency: IP & T Group LLP
- Priority: KR10-2018-0035542 20180328
- Main IPC: G11C11/40
- IPC: G11C11/40 ; H01L27/108 ; G11C11/4093 ; H01L29/10 ; H01L29/78 ; G11C11/4096 ; G11C11/406 ; H01L21/02 ; H01L21/28 ; G11C11/404 ; H01L29/08 ; H01L29/423

Abstract:
A semiconductor memory device includes a plurality of memory cell transistors arranged along a common semiconductor layer. Each of the plurality of memory cell transistors comprises a first source/drain region and a second source/drain region formed in the common semiconductor layer; a gate stack formed on a portion of the common semiconductor layer between the first source/drain region and the second source/drain region; and an electrical floating portion in the portion of the common semiconductor layer, a charge state of the electrical floating portion being adapted to adjust a threshold voltage and a channel conductance of the memory cell transistor. The plurality of memory cell transistors connected in series with each other along the common semiconductor layer provide a memory string.
Public/Granted literature
- US20210375871A1 SEMICONDUCTOR MEMORY DEVICE, METHOD OF DRIVING THE SAME AND METHOD OF FABRICATING THE SAME Public/Granted day:2021-12-02
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