Invention Grant
- Patent Title: Drain-extended transistor
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Application No.: US17123835Application Date: 2020-12-16
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Publication No.: US11456381B2Publication Date: 2022-09-27
- Inventor: Meng-Chia Lee , Sunglyong Kim , Seetharaman Sridhar , Sameer Pendharkar
- Applicant: TEXAS INSTRUMENTS INCORPORATED
- Applicant Address: US TX Dallas
- Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee Address: US TX Dallas
- Agent Andrew R. Ralston; Charles A. Brill; Frank D. Cimino
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/66 ; H01L29/10

Abstract:
Described examples include an integrated circuit having a semiconductor substrate. The integrated circuit has a transistor that includes a buried layer having within the substrate, the buried layer defining a drift region between the buried layer and the top surface and a body region in the substrate extending from the buried layer to the surface of the substrate. The transistor also having a source formed in the body region, a drain extending from the buried layer to the surface of the substrate, a drift well extending from the buried layer toward the top surface and extending from the body region to the drain, a drift surface layer located between the drift well and the top, and a gate proximate to the surface of the substrate at the body region.
Public/Granted literature
- US20220190158A1 DRAIN-EXTENDED TRANSISTOR Public/Granted day:2022-06-16
Information query
IPC分类: