A semiconductor structure may include a heater surrounded by a dielectric layer, a projection liner on top of the heater, a phase change material layer above the projection liner, and a top electrode contact surrounding a top portion of the phase change material layer, The projection liner may cover a top surface of the heater. The projection liner may separate the phase change material layer from the second dielectric layer and the heater. The projection liner may provide a parallel conduction path in the crystalline phase and the amorphous phase of the phase change material layer. The top electrode contact may be separated from the phase change material layer by a metal liner. The semiconductor structure may include a bottom electrode below and in electrical contact with the heater and a top electrode above and in electrical contact with the phase change material layer.