Invention Grant
- Patent Title: Method and system for measurement of ultra-high laser intensity
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Application No.: US16925003Application Date: 2020-07-09
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Publication No.: US11456570B2Publication Date: 2022-09-27
- Inventor: Jean-Claude Kieffer
- Applicant: Institut National de la Recherche Scientifique
- Applicant Address: CA Quebec
- Assignee: Institut National de la Recherche Scientifique
- Current Assignee: Institut National de la Recherche Scientifique
- Current Assignee Address: CA Quebec
- Agency: Lavery, De Billy, LLP
- Agent Gwendoline Bruneau
- Main IPC: H01S3/10
- IPC: H01S3/10 ; H01S3/08 ; G01N21/55 ; H01S3/00 ; H01S3/11

Abstract:
A method and a system for measurement of high laser field intensity, the method comprising tight focusing a non-Gaussian azimuthally polarized laser mode beam to a focusing spot, measuring a spectral line shape of a selected ionization state induced by a longitudinal oscillating magnetic field created by the tight focusing in the focusing spot; and determining the laser intensity from the spectral line shape. The system comprises a laser source of a peak power in a range between 100 terawatt and 10 petawatt; a converter unit; a tight focusing optics; and spectral measurement means; wherein the converter unit polarizes a main laser beam from the laser source into a non-Gaussian azimuthally polarized laser mode beam; the tight focusing optics focuses the azimuthally polarized laser mode beam to a focusing spot, yielding a longitudinal oscillating magnetic field of an intensity proportional to the laser intensity, the spectral measurement means measuring a line shape of a selected ionization state induced by the longitudinal oscillating magnetic field in focusing spot.
Public/Granted literature
- US20210013691A1 METHOD AND SYSTEM FOR MEASUREMENT OF ULTRA-HIGH LASER INTENSITY Public/Granted day:2021-01-14
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