Invention Grant
- Patent Title: Charged particle beam apparatus and cleaning method
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Application No.: US16616165Application Date: 2017-06-21
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Publication No.: US11458513B2Publication Date: 2022-10-04
- Inventor: Akinari Morikawa , Kotaro Hosoya
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- International Application: PCT/JP2017/022854 WO 20170621
- International Announcement: WO2018/235194 WO 20181227
- Main IPC: B08B7/00
- IPC: B08B7/00 ; H01J37/20 ; H01J37/26 ; H01J37/32
Abstract:
To provide a charged particle beam apparatus. The charged particle beam apparatus includes: a stage on which a sample is placed; a cleaner configured to remove a contaminant on the sample; and a stage control unit configured to adjust a relative positional relationship between the cleaner and the sample by moving the stage during use of the cleaner.
Public/Granted literature
- US20200206789A1 Charged Particle Beam Apparatus and Cleaning Method Public/Granted day:2020-07-02
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