Invention Grant
- Patent Title: LTCC substrate and preparation method thereof
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Application No.: US16971698Application Date: 2019-11-07
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Publication No.: US11459265B2Publication Date: 2022-10-04
- Inventor: Tao Chen , Kun Huang , Shiwo Ta , Zhenxiao Fu , Yun Liu
- Applicant: GUANGDONG FENGHUA ADVANCED TECHNOLOGY HOLDING CO., LTD.
- Applicant Address: CN Guangdong
- Assignee: GUANGDONG FENGHUA ADVANCED TECHNOLOGY HOLDING CO., LTD.
- Current Assignee: GUANGDONG FENGHUA ADVANCED TECHNOLOGY HOLDING CO., LTD.
- Current Assignee Address: CN Guangdong
- Agent Gang Yu
- Priority: CN201910155188.X 20190301
- International Application: PCT/CN2019/116357 WO 20191107
- International Announcement: WO2020/177368 WO 20200910
- Main IPC: C03B19/06
- IPC: C03B19/06 ; C03C12/00 ; C03C3/093
Abstract:
The disclosure relates to a Low Temperature Co-fired Ceramic (LTCC) substrate and a preparation method thereof, and in particular to a dielectric-constant-adjustable LTCC substrate and a preparation method thereof. The LTCC substrate of the disclosure includes the following components: glass, SiO2 and Al2O3, a weight percentage of the SiO2 in the LTCC substrate is 10% to 25%.
Public/Granted literature
- US20210387890A1 LTCC substrate and preparation method thereof Public/Granted day:2021-12-16
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