- Patent Title: Films with enhanced scuff resistance, clarity, and conformability
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Application No.: US14728264Application Date: 2015-06-02
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Publication No.: US11459488B2Publication Date: 2022-10-04
- Inventor: Christopher J. Blackwell , Sara E. Porosky
- Applicant: Avery Dennison Corporation
- Applicant Address: US CA Glendale
- Assignee: Avery Dennison Corporation
- Current Assignee: Avery Dennison Corporation
- Current Assignee Address: US CA Glendale
- Main IPC: C09J7/29
- IPC: C09J7/29 ; C09J7/22 ; C09J7/38 ; B32B27/30 ; B32B27/32 ; B32B7/00 ; C08L23/06 ; C08L23/12 ; G09F3/10 ; C08L23/08 ; C08L23/14 ; C09J7/24 ; G09F3/02

Abstract:
Compositions which are well suited for forming into machine direction orientation (MDO) films are described. Multilayer films containing one or more layers of the compositions and/or films are also described. Additionally, label assemblies utilizing the multilayer films, labeled substrates, and related methods are described. Various versions of the multilayer films are described including films having at least two skin layers and an interior core layer. Particular multilayer films are described having polyethylene rich cores.
Public/Granted literature
- US20150344741A1 Films with Enhanced Scuff Resistance, Clarity, and Conformability Public/Granted day:2015-12-03
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