Invention Grant
- Patent Title: Resist composition and patterning process
-
Application No.: US16729643Application Date: 2019-12-30
-
Publication No.: US11460773B2Publication Date: 2022-10-04
- Inventor: Jun Hatakeyama , Takayuki Fujiwara , Masaki Ohashi
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: WHDA, LLP
- Priority: JPJP2019-010892 20190125
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/038 ; C08F220/18 ; C08F212/14 ; C07C49/175 ; G03F7/32 ; G03F7/16 ; G03F7/20 ; G03F7/38
Abstract:
A resist composition comprising a base polymer and a quencher in the form of an amine compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
Public/Granted literature
- US20200241417A1 RESIST COMPOSITION AND PATTERNING PROCESS Public/Granted day:2020-07-30
Information query
IPC分类:
