Invention Grant
- Patent Title: Method and device for exposure of photosensitive layer
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Application No.: US16470709Application Date: 2016-12-20
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Publication No.: US11460777B2Publication Date: 2022-10-04
- Inventor: Bernhard Thallner , Boris Povazay
- Applicant: EV Group E. Thallner GmbH
- Applicant Address: AT St. Florian am Inn
- Assignee: EV Group E. Thallner GmbH
- Current Assignee: EV Group E. Thallner GmbH
- Current Assignee Address: AT St. Florian am Inn
- Agency: Kusner & Jaffe
- International Application: PCT/EP2016/081880 WO 20161220
- International Announcement: WO2018/113917 WO 20180628
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method and device for exposing a light-sensitive layer, said method comprising: generating at least one light ray by use of at least one light source, illuminating pixels of an exposure pattern by use of at least one micromirror device having a plurality of micromirrors with respective mirror intensity profiles, and overlaying the mirror intensity profiles of adjacent micromirrors to provide a pattern intensity profile of the exposure pattern by summing the mirror intensity profiles of each illuminated pixel of the exposure pattern.
Public/Granted literature
- US20200089121A1 METHOD AND DEVICE FOR EXPOSURE OF PHOTOSENSITIVE LAYER Public/Granted day:2020-03-19
Information query
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