Invention Grant
- Patent Title: Method for the qualification of a mask for microlithography
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Application No.: US16880132Application Date: 2020-05-21
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Publication No.: US11460785B2Publication Date: 2022-10-04
- Inventor: Dirk Hellweg
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102017220872.4 20171122
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
For the qualification of a mask for microlithography, the effect of an aerial image of the mask on the wafer is ascertained by means of a simulation for predicting the wafer structures producible by means of the mask.
Public/Granted literature
- US20200285158A1 METHOD FOR THE QUALIFICATION OF A MASK FOR MICROLITHOGRAPHY Public/Granted day:2020-09-10
Information query
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