Invention Grant
- Patent Title: Method and apparatus for simulating clothes
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Application No.: US17027369Application Date: 2020-09-21
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Publication No.: US11461967B2Publication Date: 2022-10-04
- Inventor: Hohyun Lee , Yeji Kim
- Applicant: CLO Virtual Fashion Inc.
- Applicant Address: KR Seoul
- Assignee: CLO Virtual Fashion Inc.
- Current Assignee: CLO Virtual Fashion Inc.
- Current Assignee Address: KR Seoul
- Agency: Fenwick & West LLP
- Priority: KR10-2019-0101263 20190819,KR10-2020-0104061 20200819
- Main IPC: G06T17/20
- IPC: G06T17/20 ; A41H3/00 ; G06T11/20 ; G06T17/10 ; G06T19/20

Abstract:
A method and apparatus for simulating clothes receive a user setting for an area in which shirring is to be expressed in a two-dimensional (2D) pattern of clothes modeled with a mesh including a plurality of polygons, obtain a first line and a second line parallel to the first line from the area based on the user setting, generate inner lines that are perpendicular to at least one of the first line and the second line of the area between the first line and the second line and that have regular intervals, align polygons included in the area of the 2D pattern based on the inner lines, and perform a draping simulation of three-dimensional (3D) clothes corresponding to the 2D pattern in which the shirring is expressed by the aligned polygons.
Public/Granted literature
- US20210217237A1 METHOD AND APPARATUS FOR SIMULATING CLOTHES Public/Granted day:2021-07-15
Information query