Invention Grant
- Patent Title: Translating and rotating chuck for processing microelectronic substrates in a process chamber
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Application No.: US15824021Application Date: 2017-11-28
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Publication No.: US11476129B2Publication Date: 2022-10-18
- Inventor: Edward Deneen Hanzlik , Michael W. Gruenhagen , Tim W. Herbst
- Applicant: TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Applicant Address: US MN Chaska
- Assignee: TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Current Assignee: TEL MANUFACTURING AND ENGINEERING OF AMERICA, INC.
- Current Assignee Address: US MN Chaska
- Agency: Kagan Binder, PLLC
- Main IPC: B08B7/00
- IPC: B08B7/00 ; H01L21/02 ; H01L21/67 ; H01L21/687

Abstract:
Cleaning systems and methods for semiconductor fabrication use rotatable and translatable chuck assemblies that incorporate a compact drive system to cause chuck rotation. The system uses an offset drive gear that drives a ring gear. This reduces components whose friction or lubricants might generate undue contamination. The low friction chuck functionality of the present invention is useful in any fabrication tool in which a workpiece is supported on a rotating support during a treatment. The chuck is particularly useful in cryogenic cleaning treatments.
Public/Granted literature
- US20180151396A1 TRANSLATING AND ROTATING CHUCK FOR PROCESSING MICROELECTRONIC SUBSTRATES IN A PROCESS CHAMBER Public/Granted day:2018-05-31
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