Invention Grant
- Patent Title: Derivatized polyamino acids
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Application No.: US17123295Application Date: 2020-12-16
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Publication No.: US11492514B2Publication Date: 2022-11-08
- Inventor: Na Zhang , David Bailey , Kevin P. Dockery , Roman A. Ivanov , Deepak Shukla
- Applicant: CMC Materials, Inc.
- Applicant Address: US IL Aurora
- Assignee: CMC Materials, Inc.
- Current Assignee: CMC Materials, Inc.
- Current Assignee Address: US IL Aurora
- Agent Thomas Omholt
- Main IPC: C09G1/02
- IPC: C09G1/02 ; C08G69/48 ; H01L21/3105 ; H01L21/321 ; C09G1/04 ; C09G1/06 ; B24B1/00 ; B24B37/04 ; C09K3/14 ; C09G1/00 ; H01L21/306 ; C09K13/06 ; C08G69/10

Abstract:
A composition comprises, consists of, or consists essentially of a polymer including a derivatized amino acid monomer unit. A chemical mechanical polishing composition includes a water based liquid carrier, abrasive particles dispersed in the liquid carrier, and a cationic polymer having a derivatized amino acid monomer unit. A method of chemical mechanical polishing includes utilizing the chemical mechanical polishing composition to remove at least a portion of a metal or dielectric layer from a substrate and thereby polish the substrate.
Public/Granted literature
- US20210206920A1 DERIVATIZED POLYAMINO ACIDS Public/Granted day:2021-07-08
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