Invention Grant
- Patent Title: Anti-reflective hardmask composition
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Application No.: US16745481Application Date: 2020-01-17
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Publication No.: US11493849B2Publication Date: 2022-11-08
- Inventor: Sang Jun Choi , Wanuk Kim
- Applicant: OLAS CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: OLAS CO., LTD.
- Current Assignee: OLAS CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Agency: Lex IP Meister, PLLC
- Priority: KR10-2019-0006959 20190118
- Main IPC: G03F7/11
- IPC: G03F7/11 ; C08G14/06 ; C09D5/00 ; C09D161/34
Abstract:
Provided is an anti-reflective hardmask composition including: (a) a polymer composed of an indolocarbazole represented by the following Chemical Formula 1 or a polymeric blend containing the same; and (b) an organic solvent.
Public/Granted literature
- US20200233305A1 ANTI-REFLECTIVE HARDMASK COMPOSITION Public/Granted day:2020-07-23
Information query
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