- Patent Title: Display substrate and manufacturing method thereof, display device
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Application No.: US16772272Application Date: 2019-12-19
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Publication No.: US11495623B2Publication Date: 2022-11-08
- Inventor: Yanan Niu , Kuanjun Peng , Jiushi Wang , Zhanfeng Cao , Feng Zhang , Qi Yao , Wusheng Li , Feng Guan , Lei Chen , Jintao Peng , Tingting Zhou
- Applicant: BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Nath, Goldberg & Meyer
- Agent Joshua B. Goldberg
- Priority: CN201910003413.8 20190103
- International Application: PCT/CN2019/126652 WO 20191219
- International Announcement: WO2020/140763 WO 20200709
- Main IPC: H01L27/12
- IPC: H01L27/12

Abstract:
The present disclosure provides a display substrate and a manufacturing method thereof, and a display device. In the display substrate of the present disclosure, a first transistor comprises a first gate electrode, a first electrode, a second electrode, and a first active layer; and a second transistor comprises a second gate electrode, a third electrode, a fourth electrode, and a second active layers, wherein the first active layer comprises a silicon material, the second active layer comprises an oxide semiconductor material, and wherein the third electrode and the first gate electrode are disposed in the same layer, and the fourth electrode and the first electrode, the second electrodes are disposed in the same layer.
Public/Granted literature
- US20210225877A1 DISPLAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, DISPLAY DEVICE Public/Granted day:2021-07-22
Information query
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