Invention Grant
- Patent Title: Method of forming stacked ferroelectric non- planar capacitors in a memory bit-cell
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Application No.: US17390791Application Date: 2021-07-30
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Publication No.: US11501813B1Publication Date: 2022-11-15
- Inventor: Rajeev Kumar Dokania , Noriyuki Sato , Tanay Gosavi , Pratyush Pandey , Debo Olaosebikan , Amrita Mathuriya , Sasikanth Manipatruni
- Applicant: Kepler Computing Inc.
- Applicant Address: US CA San Francisco
- Assignee: Kepler Computing Inc.
- Current Assignee: Kepler Computing Inc.
- Current Assignee Address: US CA San Francisco
- Agency: Mughal IP P.C.
- Main IPC: G11C11/22
- IPC: G11C11/22 ; G11C11/417

Abstract:
A high-density low voltage ferroelectric (or paraelectric) memory bit-cell that includes a planar ferroelectric or paraelectric capacitor. The memory bit-cell comprises 1T1C configuration, where a plate-line is parallel to a word-line, or the plate-line is parallel to a bit-line. The memory bit-cell can be 1TnC, where ‘n’ is a number. In a 1TnC bit-cell, the capacitors are vertically stacked allowing for multiple values to be stored in a single bit-cell. The memory bit-cell can be multi-element FE gain bit-cell. In a multi-element FE gain bit-cell, data sensing is done with signal amplified by a gain transistor in the bit-cell. As such, higher storage density is realized using multi-element FE gain bit-cells. In some examples, the 1T1C, 1TnC, and multi-element FE gain bit-cells are multi-level bit-cells. To realize multi-level bit-cells, the capacitor is placed in a partially switched polarization state by applying different voltage levels or different time pulse widths at the same voltage level.
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