Invention Grant
- Patent Title: Semiconductor structure having via through bonded wafers and manufacturing method thereof
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Application No.: US16983533Application Date: 2020-08-03
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Publication No.: US11502038B2Publication Date: 2022-11-15
- Inventor: Shing-Yih Shih
- Applicant: NANYA TECHNOLOGY CORPORATION
- Applicant Address: TW New Taipei
- Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee Address: TW New Taipei
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: H01L23/538
- IPC: H01L23/538 ; H01L21/768

Abstract:
The present disclosure provides a semiconductor structure having a first wafer including a first substrate, a first dielectric layer over the first substrate, and a first conductive pad surrounded by the first dielectric layer; a second wafer including a second dielectric layer, a second substrate over the second dielectric layer, and a second conductive pad surrounded by the second dielectric layer; a bonding dielectric disposed between the first dielectric layer and the second dielectric layer to bond the first dielectric layer with the second dielectric layer; and a conductive via extending from the first conductive pad and surrounded by the bonding dielectric, the second conductive pad and the second wafer.
Public/Granted literature
- US20220037256A1 SEMICONDUCTOR STRUCTURE HAVING VIA THROUGH BONDED WAFERS AND MANUFACTURING METHOD THEREOF Public/Granted day:2022-02-03
Information query
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