Invention Grant
- Patent Title: Systems and methods for voltage contrast defect detection
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Application No.: US17073271Application Date: 2020-10-16
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Publication No.: US11513087B2Publication Date: 2022-11-29
- Inventor: Weiming Ren , Xuedong Liu , Zhong-wei Chen , Xiaoyu Ji , Xiaoxue Chen , Weimin Zhou , Frank Nan Zhang
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Main IPC: G01N23/2202
- IPC: G01N23/2202 ; G01N1/44 ; G01N23/2251

Abstract:
Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.
Public/Granted literature
- US20210116398A1 SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION Public/Granted day:2021-04-22
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