Invention Grant
- Patent Title: Physical vapor deposition processing systems target cooling
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Application No.: US17316883Application Date: 2021-05-11
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Publication No.: US11515132B2Publication Date: 2022-11-29
- Inventor: Sanjay Bhat , Vibhu Jindal , Vishwas Kumar Pandey
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/34 ; C23C14/35 ; C22C9/04 ; C22C9/06 ; B23K15/00 ; B23K1/20 ; B23K1/00 ; B23K1/19 ; C23C14/54 ; B23K103/12
Abstract:
Physical vapor deposition target assemblies and methods of manufacturing such target assemblies are disclosed. An exemplary target assembly comprises a flow pattern including a plurality of arcs and bends fluidly connected to an inlet end and an outlet end.
Public/Granted literature
- US20210272785A1 Physical Vapor Deposition Processing Systems Target Cooling Public/Granted day:2021-09-02
Information query
