Invention Grant
- Patent Title: Method of treating a solid layer bonded to a carrier substrate
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Application No.: US17067899Application Date: 2020-10-12
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Publication No.: US11518066B2Publication Date: 2022-12-06
- Inventor: Franz Schilling , Wolfram Drescher , Jan Richter
- Applicant: Siltectra GmbH
- Applicant Address: DE Dresden
- Assignee: Siltectra GmbH
- Current Assignee: Siltectra GmbH
- Current Assignee Address: DE Dresden
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE102015004601.2 20150409
- Main IPC: B28D5/00
- IPC: B28D5/00 ; B23K26/00 ; H01L21/00 ; B81C1/00 ; H01L31/00 ; B23K26/53 ; B28D1/22 ; H01L21/762 ; H01L31/18 ; B23K101/36

Abstract:
A method for treating a solid layer includes: providing a multi-layer assembly having a carrier substrate and a solid layer bonded to the carrier substrate by a bonding layer, the solid layer having an exposed surface including a defined surface structure, the defined surface structure resulting from a removal, which is effected by a crack, from a donor substrate, at least in sections; processing the solid layer, which is arranged on the carrier substrate; and separating the solid layer from the carrier substrate by a destruction of the bonding layer.
Public/Granted literature
- US20210039279A1 Method of Treating a Solid Layer Bonded to a Carrier Substrate Public/Granted day:2021-02-11
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