Invention Grant
- Patent Title: Stereo lithographic 3D printing assembly and stereo lithographic 3D printing method
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Application No.: US17604870Application Date: 2020-04-20
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Publication No.: US11518088B2Publication Date: 2022-12-06
- Inventor: Suhas Nawada
- Applicant: UNIVERSITEIT VAN AMSTERDAM
- Applicant Address: NL Amsterdam
- Assignee: UNIVERSITEIT VAN AMSTERDAM
- Current Assignee: UNIVERSITEIT VAN AMSTERDAM
- Current Assignee Address: NL Amsterdam
- Agency: AEON Law, PLLC
- Agent Adam L. K. Philipp; David V. H. Cohen
- Priority: EP19170376 20190419
- International Application: PCT/EP2020/061014 WO 20200420
- International Announcement: WO2020/212625 WO 20201022
- Main IPC: B29C64/286
- IPC: B29C64/286 ; B29C64/129 ; B33Y10/00 ; B33Y30/00
Abstract:
The invention provides a stereo lithographic 3D printing assembly comprising a digital projection system for projecting a first pattern having a first resolution at a projection location, and a photo mask system for projecting a second pattern having a second resolution at said projection location. This provides a fast 3D printing assembly allowing high resolution details.
Public/Granted literature
- US20220088853A1 STEREO LITHOGRAPHIC 3D PRINTING ASSEMBLY AND STEREO LITHOGRAPHIC 3D PRINTING METHOD Public/Granted day:2022-03-24
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