Invention Grant
- Patent Title: Method for making porous graphene membranes and membranes produced using the method
-
Application No.: US16308127Application Date: 2017-06-09
-
Publication No.: US11518142B2Publication Date: 2022-12-06
- Inventor: Murray Height , Hyung Gyu Park , Kyoungjun Choi
- Applicant: ETH Zurich , HeiQ Materials AG
- Applicant Address: CH Zurich; CH Schlieren
- Assignee: ETH Zurich,HeiQ Materials AG
- Current Assignee: ETH Zurich,HeiQ Materials AG
- Current Assignee Address: CH Zurich; CH Schlieren
- Agency: The Webb Law Firm
- Priority: EP16174017 20160610
- International Application: PCT/EP2017/064156 WO 20170609
- International Announcement: WO2017/212039 WO 20171214
- Main IPC: B32B9/00
- IPC: B32B9/00 ; B01D71/02 ; C01B32/186 ; A41D31/102 ; B01D67/00 ; B01D69/10 ; B32B9/04 ; C23C16/26 ; H01L21/02 ; H01L29/16 ; B82Y30/00

Abstract:
Method for making a porous graphene layer of a thickness of less than 100 nm with pores having an average size in the range of 5-900 nm, includes the following steps: providing a catalytically active substrate catalyzing graphene formation under chemical vapor deposition conditions, the catalytically active substrate in or on its surface being provided with a plurality of catalytically inactive domains having a size essentially corresponding to the size of the pores in the resultant porous graphene layer; chemical vapor deposition using a carbon source in the gas phase and formation of the porous graphene layer on the surface of the catalytically active substrate. The pores in the graphene layer are in situ formed due to the presence of the catalytically inactive domains.
Public/Granted literature
- US20190168485A1 Method for Making Porous Graphene Membranes and Membranes Produced Using the Method Public/Granted day:2019-06-06
Information query