Invention Grant
- Patent Title: Fluorine-containing compound, substrate for patterning, photodegradable coupling agent, patterning method, and compound
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Application No.: US16193526Application Date: 2018-11-16
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Publication No.: US11518731B2Publication Date: 2022-12-06
- Inventor: Kazuo Yamaguchi , Yusuke Kawakami
- Applicant: Kanagawa University , NIKON CORPORATION
- Applicant Address: JP Yokohama; JP Tokyo
- Assignee: Kanagawa University,NIKON CORPORATION
- Current Assignee: Kanagawa University,NIKON CORPORATION
- Current Assignee Address: JP Yokohama; JP Tokyo
- Priority: JP2013-176023 20130827
- Main IPC: C07C205/12
- IPC: C07C205/12 ; C07C205/36 ; C07C205/37 ; G03F7/20 ; C07F7/18 ; C07D207/46 ; G03F7/075 ; G03F7/16
Abstract:
A method for producing a fluorine-containing compound represented by General formula (1), wherein X represents a halogen atom or an alkoxy group, R1 represents a hydrogen atom or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, Rf1 and Rf2 are each independently a fluorinated alkoxy group, and n represents an integer of 0 or more.
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