Invention Grant
- Patent Title: Photosensitive resin composition and photosensitive dry film
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Application No.: US16666757Application Date: 2019-10-29
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Publication No.: US11518876B2Publication Date: 2022-12-06
- Inventor: Yoichiro Ichioka , Kazunori Kondo
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: WHDA, LLP
- Priority: JPJP2018-206503 20181101
- Main IPC: C08L65/02
- IPC: C08L65/02 ; C08G59/14 ; C08J7/18 ; C08K5/00 ; C08L63/00 ; C08L83/04

Abstract:
A photosensitive resin composition is provided comprising (A) 100 pbw of a phenolic hydroxyl group-containing resin, and (B) 0.1-18 pbw of an epoxy additive in the form of a compound containing 1-8 epoxy groups per molecule, containing nitrogen, sulfur or phosphorus, and having a molecular weight of 50-6,000. The composition has an improved bonding force to metal wirings.
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