Invention Grant
- Patent Title: Flow rate control system and flow rate measurement method
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Application No.: US17264173Application Date: 2019-07-16
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Publication No.: US11519769B2Publication Date: 2022-12-06
- Inventor: Masaaki Nagase , Satoru Yamashita , Masayoshi Kawashima , Masahiko Takimoto , Kouji Nishino , Nobukazu Ikeda
- Applicant: FUJIKIN INCORPORATED
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Agency: Studebaker & Brackett PC
- Priority: JPJP2018-143005 20180730
- International Application: PCT/JP2019/027880 WO 20190716
- International Announcement: WO2020/026784 WO 20200206
- Main IPC: G01F1/88
- IPC: G01F1/88

Abstract:
A control unit 3 of a flow rate control system 1 comprises: a recording unit 31 for recording measured values of a pressure sensor P and a temperature sensor T, a storage unit 32 for storing volume data between a first valve V1 and a second valve V2 corresponding to the measured value of the pressure sensor P, and an arithmetic unit 33 for calculating a flow rate based on a first pressure value P1 and a first temperature value T1 measured after opening the first valve V1 and the second valve V2 to flow a gas and then closing the first valve V1 and the second valve V2 simultaneously in a state where the gas is flowing; a second pressure value P2 and a second temperature value T2 measured after opening the first valve V1 and the second valve V2 to flow a gas, closing the second valve V2 in a state where the gas is flowing, and then closing the first valve V1 after a predetermined time Δt has elapsed; and a volume value V between the first valve V1 and the second valve V2 which corresponds to the second pressure value P2.
Public/Granted literature
- US20210310844A1 FLOW RATE CONTROL SYSTEM AND FLOW RATE MEASUREMENT METHOD Public/Granted day:2021-10-07
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