- Patent Title: Uniformity control for radio frequency plasma processing systems
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Application No.: US17145190Application Date: 2021-01-08
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Publication No.: US11521832B2Publication Date: 2022-12-06
- Inventor: Stephen E. Savas , Alexandre De Chambrier
- Applicant: COMET TECHNOLOGIES USA, INC.
- Applicant Address: US CA San Jose
- Assignee: COMET TECHNOLOGIES USA, INC.
- Current Assignee: COMET TECHNOLOGIES USA, INC.
- Current Assignee Address: US CA San Jose
- Agency: Nolte Lackenbach Siegel
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01J37/20 ; H01J37/244
Abstract:
A radio frequency plasma processing system including a reaction chamber, a pedestal disposed in the reaction chamber, and a plurality of sector plates disposed azimuthally around the pedestal in an annulus between the pedestal and the reaction chamber.
Public/Granted literature
- US20210217589A1 UNIFORMITY CONTROL FOR RADIO FREQUENCY PLASMA PROCESSING SYSTEMS Public/Granted day:2021-07-15
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