Invention Grant
- Patent Title: Hydrogen assisted atmospheric radical oxidation
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Application No.: US16861345Application Date: 2020-04-29
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Publication No.: US11521847B2Publication Date: 2022-12-06
- Inventor: Michael X. Yang , Christian Pfahler , Alexandr Cosceev
- Applicant: Mattson Technology, Inc. , Beijing E-Town Semiconductor Technology Co., Ltd.
- Applicant Address: US CA Fremont; CN Beijing
- Assignee: Mattson Technology, Inc.,Beijing E-Town Semiconductor Technology Co., Ltd.
- Current Assignee: Mattson Technology, Inc.,Beijing E-Town Semiconductor Technology Co., Ltd.
- Current Assignee Address: US CA Fremont; CN Beijing
- Agency: Dority & Manning, P.A.
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/67

Abstract:
Apparatus, systems, and methods for processing workpieces are provided. In one example implementation, a hydrogen gas mixed with an inert gas can be reacted with an oxygen gas to oxidize a workpiece at atmospheric pressure. A chemical reaction of a hydrogen gas with an oxygen gas facilitated by a hot workpiece surface can positively affect an oxidation process. A reaction speed of the chemical reaction can be slowed down by mixing the hydrogen gas with an inert gas. Such mixture can effectively reduce a partial pressure of the hydrogen gas. As such, the oxidation process can be carried out at atmospheric pressure, thereby, in an atmospheric thermal processing chamber.
Public/Granted literature
- US20200350158A1 Hydrogen Assisted Atmospheric Radical Oxidation Public/Granted day:2020-11-05
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