Invention Grant
- Patent Title: Substrate processing apparatus and recording medium for changing atmosphere of transfer chamber
-
Application No.: US16522265Application Date: 2019-07-25
-
Publication No.: US11521880B2Publication Date: 2022-12-06
- Inventor: Satoru Takahata , Ichiro Nunomura , Tsukasa Iida , Hitoshi Sekihara , Kazunori Tsutsuguchi , Jin Shibata
- Applicant: KOKUSAI ELECTRIC CORPORATION
- Applicant Address: JP Tokyo
- Assignee: KOKUSAI ELECTRIC CORPORATION
- Current Assignee: KOKUSAI ELECTRIC CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Volpe Koenig
- Priority: JPJP2018-141216 20180727
- Main IPC: H01L21/677
- IPC: H01L21/677 ; C23C14/56 ; C23C16/44 ; H01L21/673 ; H01L21/67

Abstract:
There is provided a configuration that includes: an intake damper and an intake fan configured to communicate with an intake port that sucks air to a transfer chamber connected to a process chamber; a valve of an inert gas introduction pipe configured to supply an inert gas to the transfer chamber; an exhaust fan and a first exhaust valve installed in the transfer chamber; a switch configured to select one of an atmospheric mode in which an atmosphere of the transfer chamber is an air atmosphere and a purge mode in which the atmosphere of the transfer chamber is an inert gas atmosphere; and a controller configured to control each of the intake damper, the intake fan, the valve of the inert gas introduction pipe, the exhaust fan, and the first exhaust valve to execute one of the atmospheric mode and the purge mode.
Public/Granted literature
- US20200035533A1 SUBSTRATE PROCESSING APPARATUS AND RECORDING MEDIUM Public/Granted day:2020-01-30
Information query
IPC分类: