Invention Grant
- Patent Title: Semiconductor Schottky rectifier device
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Application No.: US16922048Application Date: 2020-07-07
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Publication No.: US11527627B2Publication Date: 2022-12-13
- Inventor: Kolins Chao , John Huang
- Applicant: Diodes Incorporated
- Applicant Address: US TX Plano
- Assignee: Diodes Incorporated
- Current Assignee: Diodes Incorporated
- Current Assignee Address: US TX Plano
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L29/417
- IPC: H01L29/417 ; H01L29/872 ; H01L29/40 ; H01L23/00

Abstract:
A semiconductor Schottky rectifier built in an epitaxial semiconductor layer over a substrate has an anode structure and a cathode structure extending from the surface of the epitaxial layer. The cathode contact structure has a trench structure near the epi-layer and a vertical sidewall surface covered with a gate oxide layer. The cathode structure further comprises a polysilicon element adjacent to the gate oxide layer.
Public/Granted literature
- US20210217857A1 SEMICONDUCTOR SCHOTTKY RECTIFIER DEVICE Public/Granted day:2021-07-15
Information query
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