Invention Grant
- Patent Title: Slurry composition, cured product of the slurry composition, and substrate, film and prepreg using the cured product
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Application No.: US16828525Application Date: 2020-03-24
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Publication No.: US11530324B2Publication Date: 2022-12-20
- Inventor: Yoshihiro Tsutsumi , Hiroyuki Iguchi , Yuki Kudo , Atsushi Tsuura
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPJP2019-072411 20190405
- Main IPC: C08L79/08
- IPC: C08L79/08 ; C08J5/18 ; C08J5/24 ; C08K3/36

Abstract:
Provided are a slurry composition having a low thixotropy and a superior handling property; a cured product of this slurry composition; and a substrate, film and prepreg using such cured product, the substrate, film and prepreg exhibiting excellent mechanical properties and a low relative permittivity and dielectric tangent. The slurry composition has a thixotropic ratio of not higher than 3.0, and comprises: (A) a cyclic imide compound having, per molecule, at least one dimer acid backbone, at least one linear alkylene group having not less than 6 carbon atoms, and at least two cyclic imide groups; (B) spherical silica fine particles and/or alumina fine particles having an average particle size of 0.05 to 20 μm when measured by a laser diffraction method; (C) a silane coupling agent capable of reacting with the components (A) and (B); and (D) an organic solvent.
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