Invention Grant
- Patent Title: Positive-working photoresist composition, pattern produced therefrom, and method for producing pattern
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Application No.: US16498829Application Date: 2018-07-25
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Publication No.: US11531268B2Publication Date: 2022-12-20
- Inventor: Min Young Lim , Tae Seob Lee , Ji Hye Kim
- Applicant: LG CHEM, LTD.
- Applicant Address: KR Seoul
- Assignee: LG CHEM, LTD.
- Current Assignee: LG CHEM, LTD.
- Current Assignee Address: KR Seoul
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: KR10-2017-0097280 20170731
- International Application: PCT/KR2018/008431 WO 20180725
- International Announcement: WO2019/027181 WO 20190207
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/30 ; G03F7/033
Abstract:
The present invention provides a positive photoresist composition having excellent storage stability, sensitivity, developing properties, plating resistance, and heat resistance. More specifically, a specific dissolution inhibitor in the form of an oligomer having the same repeating unit structure as the resin contained in the photoresist composition is applied to said composition.
Public/Granted literature
- US20210011379A1 POSITIVE-WORKING PHOTORESIST COMPOSITION, PATTERN PRODUCED THEREFROM, AND METHOD FOR PRODUCING PATTERN Public/Granted day:2021-01-14
Information query
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