Invention Grant
- Patent Title: System and method for optimizing a lithography exposure process
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Application No.: US17407678Application Date: 2021-08-20
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Publication No.: US11531279B2Publication Date: 2022-12-20
- Inventor: Elvino da Silveira , Keith F. Best , Wayne Fitzgerald , Jian Lu , Xin Song , J. Casey Donaher , Christopher J. McLaughlin
- Applicant: Onto Innovation, Inc.
- Applicant Address: US MA Wilmington
- Assignee: Onto Innovation, Inc.
- Current Assignee: Onto Innovation, Inc.
- Current Assignee Address: US MA Wilmington
- Agency: Schwegman Lundberg & Woessner. P.A.
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00
Abstract:
A method for correcting misalignments is provided. An alignment for each device of a group of devices mounted on a substrate is determined. An alignment error for the group of devices mounted on the substrate is determined based on the respective alignment for each device. One or more correction factors are calculated based on the alignment error. The alignment error is corrected based on the one or more correction factors.
Public/Granted literature
- US20220075282A1 SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS Public/Granted day:2022-03-10
Information query
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