Invention Grant
- Patent Title: Controlling multiple plasma processes
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Application No.: US16664243Application Date: 2019-10-25
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Publication No.: US11538670B2Publication Date: 2022-12-27
- Inventor: Jan Peter Engelstaedter , Pawel Ozimek , Krzysztof Ruda , Jakub Swiatnicki
- Applicant: TRUMPF Huettinger Sp. z o. o.
- Applicant Address: PL Zielonka
- Assignee: TRUMPF Huettinger Sp. z o. o.
- Current Assignee: TRUMPF Huettinger Sp. z o. o.
- Current Assignee Address: PL Zielonka
- Agency: Fish & Richardson P.C.
- Priority: EP17168575 20170427
- Main IPC: H01J37/24
- IPC: H01J37/24 ; H05H1/24 ; H01J37/32 ; C23C16/455 ; C23C16/50 ; H02M5/458 ; H02M1/32 ; H02M7/06 ; H02M7/5387 ; H02M1/00

Abstract:
A power converter is capable to convert an electrical input power into a bipolar output power and to deliver the bipolar output power to at least two independent plasma processing chambers. The power converter includes: a power input port for connection to an electrical power delivering grid, at least two, preferably more than two, power output ports each for connection to one of the plasma process chambers, and a controller configured to control the power converter to deliver the bipolar output power to the power output ports, using one or more control parameters selected from a list comprising: power, voltage, current, excitation frequency, and threshold for protective measures, such that at least one of the control parameters at a first power output port is different from the corresponding control parameter at a different power output port.
Public/Granted literature
- US20200058475A1 CONTROLLING MULTIPLE PLASMA PROCESSES Public/Granted day:2020-02-20
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