Invention Grant
- Patent Title: Semiconductor device with electrode pad having different bonding surface heights
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Application No.: US17190121Application Date: 2021-03-02
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Publication No.: US11538779B2Publication Date: 2022-12-27
- Inventor: Hitoshi Kobayashi
- Applicant: KABUSHIKI KAISHA TOSHIBA , TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
- Applicant Address: JP Tokyo; JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA,TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
- Current Assignee: KABUSHIKI KAISHA TOSHIBA,TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
- Current Assignee Address: JP Tokyo; JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JPJP2020-159719 20200924
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L29/778

Abstract:
A semiconductor device includes a first electrode on a semiconductor element at a first location and a second electrode on the semiconductor element at a second location spaced from the first location. And insulating film covers the first electrode, the second electrode and a third electrode. First and second pads are on the insulating film. The first electrode contacts the first pad through an opening in a first portion of the insulating film. The second electrode contacts the second pad each through an opening in a second portion of the insulating film. A bonding surface of the first pad is at a first distance above one portion of the insulating film, and a second distance above another. A bonding surface of the second pad likewise at different distances above the insulating film depending on location.
Public/Granted literature
- US20220093542A1 SEMICONDUCTOR DEVICE Public/Granted day:2022-03-24
Information query
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