Invention Grant
- Patent Title: Semiconductor structure
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Application No.: US17399221Application Date: 2021-08-11
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Publication No.: US11538793B2Publication Date: 2022-12-27
- Inventor: Zhigang Duan , Jinghao Chen
- Applicant: MediaTek Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: MediaTek Singapore Pte. Ltd.
- Current Assignee: MediaTek Singapore Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L25/065 ; H01L23/522 ; H01L49/02

Abstract:
A semiconductor structure includes a first substrate, a first semiconductor die, a second semiconductor die, and a multi-terminal multi-capacitor structure. The first substrate includes a wiring structure. The first semiconductor die and the second semiconductor die are disposed on the first substrate. The multi-terminal multi-capacitor structure is disposed on the first substrate and includes a second substrate, an insulating layer, a first multi-terminal capacitor, and a second multi-terminal capacitor. The insulating layer is disposed over the second substrate. The first multi-terminal capacitor is disposed over the insulating layer and electrically coupled to the first semiconductor die through the wiring structure. The second multi-terminal capacitor is disposed over the insulating layer and electrically coupled to the second semiconductor die through the wiring structure, wherein the first multi-terminal capacitor and the second multi-terminal capacitor are electrically isolated from the second substrate.
Public/Granted literature
- US20220130800A1 SEMICONDUCTOR STRUCTURE Public/Granted day:2022-04-28
Information query
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