Invention Grant
- Patent Title: Diode with structured barrier region
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Application No.: US17016472Application Date: 2020-09-10
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Publication No.: US11538906B2Publication Date: 2022-12-27
- Inventor: Johannes Georg Laven , Roman Baburske , Alexander Philippou , Christian Philipp Sandow
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE102019125010.2 20190917
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/861 ; H01L29/66 ; H01L29/739

Abstract:
A power device includes: a diode section; a semiconductor body; a drift region extending into the diode section; trenches in the diode section and extending along a vertical direction into the semiconductor body, two adjacent trenches defining a respective mesa portion in the semiconductor body; a body region in the mesa portions; in the diode section, a barrier region between the body and drift regions and having a dopant concentration at least 100 times greater than an average dopant concentration of the drift region and a dopant dose greater than that of the body region. The barrier region has a lateral structure according to which at least 50% of the body region in the diode section is coupled to the drift region at least by the barrier region, and at least 5% of the body region in the diode section is coupled to the drift region without the barrier region.
Public/Granted literature
- US20210083051A1 Diode with Structured Barrier Region Public/Granted day:2021-03-18
Information query
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