Invention Grant
- Patent Title: Operating light sources to project patterns for disorienting visual detection systems
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Application No.: US16519015Application Date: 2019-07-23
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Publication No.: US11543502B2Publication Date: 2023-01-03
- Inventor: Yaacov Hoch , Tsvi Lev
- Applicant: NEC Corporation Of America
- Applicant Address: IL Herzlia
- Assignee: NEC Corporation Of America
- Current Assignee: NEC Corporation Of America
- Current Assignee Address: IL Herzlia
- Main IPC: G01S7/495
- IPC: G01S7/495 ; F41H13/00 ; G03B15/02 ; G06T7/246 ; H04K3/00 ; G06N20/00 ; G06K9/00 ; F41H3/00

Abstract:
Methods and systems fort operating one or more light sources to project adversarial patterns generated to disorient a machine learning based detection system, comprising generating one or more adversarial patterns configured to disorient the machine learning based detection system and operating one or more light sources configured to project one or more of the adversarial pattern(s) in association with the targeted object in order to disorient the machine learning based detection system.
Public/Granted literature
- US20210025679A1 OPERATING LIGHT SOURCES TO PROJECT PATTERNS FOR DISORIENTING VISUAL DETECTION SYSTEMS Public/Granted day:2021-01-28
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