Invention Grant
- Patent Title: System and method for controlling semiconductor manufacturing equipment
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Application No.: US16945079Application Date: 2020-07-31
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Publication No.: US11545379B2Publication Date: 2023-01-03
- Inventor: Sun-Fu Chou
- Applicant: NANYA TECHNOLOGY CORPORATION
- Applicant Address: TW New Taipei
- Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee: NANYA TECHNOLOGY CORPORATION
- Current Assignee Address: TW New Taipei
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: H01L21/673
- IPC: H01L21/673 ; G01M3/32 ; G06N5/04 ; G08B21/18 ; G06N20/00 ; G08B31/00

Abstract:
The present disclosure provides systems and methods for controlling a semiconductor manufacturing equipment. A control system includes a sensor unit capturing a set of data related to a gas pressure in the equipment, a sensor interface receiving the set of data and generating at least one input signal for a database server, and a control unit. The control unit includes a front end subsystem, a calculation subsystem, and a message and feedback subsystem. The front end subsystem performs a front end process to generate a data signal. The calculation subsystem performs an artificial intelligence analytical process to determine, according to the data signal, whether a malfunction related to the gas pressure has occurred and generate an output signal. The message and feedback subsystem generates an alert signal and a feedback signal according to the output signal and transmits the alert signal to a user.
Public/Granted literature
- US20220037180A1 SYSTEM AND METHOD FOR CONTROLLING SEMICONDUCTOR MANUFACTURING EQUIPMENT Public/Granted day:2022-02-03
Information query
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