System and method for controlling semiconductor manufacturing equipment
Abstract:
The present disclosure provides systems and methods for controlling a semiconductor manufacturing equipment. A control system includes a sensor unit capturing a set of data related to a gas pressure in the equipment, a sensor interface receiving the set of data and generating at least one input signal for a database server, and a control unit. The control unit includes a front end subsystem, a calculation subsystem, and a message and feedback subsystem. The front end subsystem performs a front end process to generate a data signal. The calculation subsystem performs an artificial intelligence analytical process to determine, according to the data signal, whether a malfunction related to the gas pressure has occurred and generate an output signal. The message and feedback subsystem generates an alert signal and a feedback signal according to the output signal and transmits the alert signal to a user.
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