Invention Grant
- Patent Title: Systems and methods for exposure control
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Application No.: US17330382Application Date: 2021-05-25
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Publication No.: US11546520B2Publication Date: 2023-01-03
- Inventor: Yiyi Shao
- Applicant: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
- Applicant Address: CN Zhejiang
- Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
- Current Assignee: ZHEJIANG DAHUA TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Zhejiang
- Agency: Metis IP LLC
- Main IPC: H04N5/235
- IPC: H04N5/235 ; G06V10/56

Abstract:
An imaging control method is provided. The method may include obtaining a current image generated based on an exposure parameter, wherein the current image includes a plurality of pixels; determining a plurality of target pixels or target pixel groups from at least portion of the plurality of pixels; determining a statistic representation based on target pixels or target pixel groups; determining a characteristic feature based on the statistic representation; and, updating the exposure parameter, based on the characteristic feature, to generate an updated image.
Public/Granted literature
- US20210281735A1 SYSTEMS AND METHODS FOR EXPOSURE CONTROL Public/Granted day:2021-09-09
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