- Patent Title: Chemical compositions and treatment systems and treatment methods using same for remediating H2S and other contaminants in fluids, including liquids,gasses and mixtures thereof
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Application No.: US17170466Application Date: 2021-02-08
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Publication No.: US11549064B2Publication Date: 2023-01-10
- Inventor: Cliffton Lee Roe , Linda Schweitzer , Leander Nunez , Jerry Pourciau
- Applicant: GAPS Technology, LLC
- Applicant Address: US LA Slidell
- Assignee: GAPS Technology, LLC
- Current Assignee: GAPS Technology, LLC
- Current Assignee Address: US LA Slidell
- Agency: Carrier, Shende & Associates, PC
- Agent Joseph P. Carrier; Fulchand P. Shende
- Main IPC: C10G19/02
- IPC: C10G19/02 ; C10G29/08
Abstract:
A treatment composition for remediating for remediating H2S and other contaminant(s) in contaminated gasses comprising: an aqueous hydroxide solution containing at least one hydroxide compound at a collective concentration of 35-55 weight percent of the aqueous hydroxide solution; at least one organic acid selected from the group consisting of fulvic acid and humic acid; and a chelating agent, wherein the aqueous hydroxide solution constitutes at least 80 wt % of the treatment composition, the at least one organic acid constitutes 0.1-3 wt % of the treatment composition, the chelating agent constitutes 0.1-6 wt % of the treatment composition, and a pH of the treatment composition is at least 12.0.
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