Invention Grant
- Patent Title: Aluminum nitride laminate member and aluminum nitride layer
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Application No.: US16783874Application Date: 2020-02-06
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Publication No.: US11549196B2Publication Date: 2023-01-10
- Inventor: Hajime Fujikura
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JPJP2019-023915 20190213
- Main IPC: C30B29/40
- IPC: C30B29/40 ; H01L33/22 ; C30B29/20 ; H01L33/12
Abstract:
There is provided an aluminum nitride laminate member including: a sapphire substrate having a base surface on which bumps are distributed periodically, each bump having a height of smaller than or equal to 500 nm; and an aluminum nitride layer provided on the base surface and having a surface on which protrusions are formed above the apices of the bumps.
Public/Granted literature
- US20200255978A1 ALUMINUM NITRIDE LAMINATE MEMBER AND ALUMINUM NITRIDE LAYER Public/Granted day:2020-08-13
Information query
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