Invention Grant
- Patent Title: Gas diffusion simulation method and apparatus therefor
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Application No.: US16747263Application Date: 2020-01-20
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Publication No.: US11549875B2Publication Date: 2023-01-10
- Inventor: Misa Yorozuya , Keiichi Yamamoto
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JPJP2018-085362 20180426,JPJP2018-089517 20180507
- Main IPC: G01N13/00
- IPC: G01N13/00 ; G06F30/20 ; G06F17/11 ; G06F113/08 ; G06F111/10

Abstract:
A gas diffusion simulation method for simulating diffusion of a gas in a porous material having many pores, the method includes: calculating, in the pores, a Knudsen diffusion coefficient based on the mean square displacement of first gas particles in spaces surrounded by wall surfaces and a Knudsen diffusion term using the Knudsen diffusion coefficient, calculating an interdiffusion term using an interdiffusion coefficient between the first gas particles and second gas particles different therefrom, and performing simulation of the gas diffusion of the first gas particles by using a diffusion equation of the first gas particles represented by the sum of the Knudsen diffusion term and the interdiffusion term.
Public/Granted literature
- US20200150014A1 GAS DIFFUSION SIMULATION METHOD AND APPARATUS THEREFOR Public/Granted day:2020-05-14
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