Invention Grant
- Patent Title: Salt, quencher, resist composition and method for producing resist pattern, and method for producing salt
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Application No.: US16889978Application Date: 2020-06-02
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Publication No.: US11550219B2Publication Date: 2023-01-10
- Inventor: Katsuhiro Komuro , Yuki Takahashi , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Buchanan, Ingersoll & Rooney PC
- Priority: JPJP2019-104596 20190604
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/38 ; C07C381/12 ; C07C303/32 ; C07C323/62 ; G03F7/16 ; C07C319/20 ; C08L25/06 ; C08L33/08

Abstract:
Disclosed are a salt represented by formula (I), and a method for producing the salt, and a quencher and a resist composition comprising the same: wherein R1 and R2 each represent a hydrocarbon group, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; R3, R4 and R5 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; m3 represents an integer of 0 to 2, and when m3 is 2, two R3 may be the same or different from each other; and m4 and m5 represent an integer of 0 to 5, and when m4 and/or m5 is/are 2 or more, a plurality of R4 and/or a plurality of R5 may be the same or different from each other.
Information query
IPC分类: