Invention Grant
- Patent Title: Coating method and coating system
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Application No.: US17377421Application Date: 2021-07-16
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Publication No.: US11550223B2Publication Date: 2023-01-10
- Inventor: Chaochao Xiong
- Applicant: CHONGQING KONKA PHOTOELECTRIC TECHNOLOGY RESEARCH INSTITUTE CO., LTD.
- Applicant Address: CN Chongqing
- Assignee: CHONGQING KONKA PHOTOELECTRIC TECHNOLOGY RESEARCH INSTITUTE CO., LTD.
- Current Assignee: CHONGQING KONKA PHOTOELECTRIC TECHNOLOGY RESEARCH INSTITUTE CO., LTD.
- Current Assignee Address: CN Chongqing
- Agent Gang Yu
- Priority: CN202010449093.1 20200525
- Main IPC: G03F7/16
- IPC: G03F7/16 ; H01L21/027

Abstract:
The present disclosure provides a coating method and a coating system. The coating method comprises: providing a substrate, and dropping a first liquid onto the substrate; dropping, onto the first liquid, a second liquid which is immiscible with the first liquid and has a density greater than that of the first liquid; and rotating the substrate, such that the first liquid is diffused on the surface of the substrate, and the second liquid is diffused on the surface of the first liquid.
Public/Granted literature
- US20210364923A1 Coating Method and Coating System Public/Granted day:2021-11-25
Information query
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