Invention Grant
- Patent Title: Substrate processing device
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Application No.: US16937013Application Date: 2020-07-23
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Publication No.: US11551949B2Publication Date: 2023-01-10
- Inventor: Hirohito Tanino
- Applicant: Kioxia Corporation
- Applicant Address: JP Minato-ku
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2019-164253 20190910
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/027 ; H01L21/311 ; H01L21/3213 ; B29C45/14 ; G03F7/16 ; B29C45/76 ; B29L31/34

Abstract:
According to one embodiment, a substrate processing device includes a stage configured to mount a substrate, a mold having a first surface facing an upper surface of an outer peripheral edge of the substrate and a second surface facing a side surface of an outer peripheral continuous with the upper surface of the outer peripheral edge, a mold moving mechanism configured to move the mold to bring the first surface close to the upper surface of the outer peripheral edge of the substrate and the second surface close to the side surface of the outer peripheral of the substrate, and a nozzle arranged in the mold, wherein the nozzle ejects resist.
Public/Granted literature
- US20210074555A1 SUBSTRATE PROCESSING DEVICE Public/Granted day:2021-03-11
Information query
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