Invention Grant
- Patent Title: Method for manufacturing an electronic device
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Application No.: US17109101Application Date: 2020-12-01
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Publication No.: US11551970B2Publication Date: 2023-01-10
- Inventor: Cheng-Chi Wang , Yeong-E Chen , Cheng-En Cheng
- Applicant: InnoLux Corporation
- Applicant Address: TW Miao-Li County
- Assignee: InnoLux Corporation
- Current Assignee: InnoLux Corporation
- Current Assignee Address: TW Miao-Li County
- Agent Winston Hsu
- Priority: CN202011141658.6 20201022
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L21/683 ; H01L21/027 ; H01L21/288 ; H01L21/48 ; H01L21/66
Abstract:
The present disclosure discloses a method for manufacturing an electronic device, including: setting a basic working area; providing a supporting platform having a plurality of vacuum valves; disposing a substrate on the supporting platform; applying vacuum attraction to a portion of the substrate through a portion of the plurality of vacuum valves, wherein the portion of the substrate corresponding to the vacuum attraction is defined as an attracted region; and performing an exposure on a portion of the attracted region, wherein an area of the attracted region is larger than the basic working area and smaller than an area of the supporting platform.
Public/Granted literature
- US20220130683A1 METHOD FOR MANUFACTURING AN ELECTRONIC DEVICE Public/Granted day:2022-04-28
Information query
IPC分类:
