Invention Grant
- Patent Title: Method for manufacturing electronic device
-
Application No.: US17276379Application Date: 2018-09-28
-
Publication No.: US11551975B2Publication Date: 2023-01-10
- Inventor: Mayuko Sakamoto
- Applicant: SHARP KABUSHIKI KAISHA
- Applicant Address: JP Sakai
- Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee Address: JP Sakai
- Agency: ScienBiziP, P.C.
- International Application: PCT/JP2018/036452 WO 20180928
- International Announcement: WO2020/065966 WO 20200402
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/78 ; H01L27/12

Abstract:
A method for manufacturing an electronic device includes the following: forming an island-shaped peeling layer onto a substrate; stacking a resin layer all over the peeling layer; forming a barrier layer over the resin layer; forming an electronic-circuit layer onto the upper surface of the barrier layer; and peeling off the resin layer from the substrate and the peeling layer.
Public/Granted literature
- US20220037208A1 METHOD FOR MANUFACTURING ELECTRONIC DEVICE Public/Granted day:2022-02-03
Information query
IPC分类: