Invention Grant
- Patent Title: Thin-film transfer method
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Application No.: US17284226Application Date: 2019-10-10
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Publication No.: US11551976B2Publication Date: 2023-01-10
- Inventor: Frank Fournel , Laurent Michaud , Pierre Montmeat
- Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: FR Paris
- Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee Address: FR Paris
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR1859456 20181012
- International Application: PCT/EP2019/077513 WO 20191010
- International Announcement: WO2020/074658 WO 20200416
- Main IPC: H01L21/78
- IPC: H01L21/78

Abstract:
A method includes transferring a layer onto a flexible substrate, the layer being located in a stack on the front face of the substrate. The substrate includes at least one supplementary stack interposed between the stack and the bulk layer of the substrate. This supplementary stack includes at least two layers with thicknesses decreasing in the direction of the front face. The method makes provision, after bonding the flexible substrate on the front face, for successively and gradually removing the various layers of the substrate. Such gradualness makes it possible to transfer a thin layer of silicon, with a thickness of less than 50 nm, onto a flexible substrate.
Public/Granted literature
- US20210343595A1 THIN-FILM TRANSFER METHOD Public/Granted day:2021-11-04
Information query
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