Invention Grant
- Patent Title: Array substrate and manufacturing method thereof
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Application No.: US16757389Application Date: 2020-02-18
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Publication No.: US11552106B2Publication Date: 2023-01-10
- Inventor: Meng Chen
- Applicant: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGYCO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGYCO., LTD.
- Current Assignee: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGYCO., LTD.
- Current Assignee Address: CN Shenzhen
- Priority: CN202010050465.3 20200117
- International Application: PCT/CN2020/075679 WO 20200218
- International Announcement: WO2021/142874 WO 20210722
- Main IPC: H01L27/12
- IPC: H01L27/12

Abstract:
An array substrate and a manufacturing method thereof are provided. A patterned metal member of the array substrate includes a patterned first metal layer, a patterned second metal layer, and a patterned copper layer which are sequentially disposed on a substrate. An etching rate at which an etching solution etches the second metal layer is less than another etching rate at which the etching solution etches the first metal layer. An adhesion force between the patterned first metal layer and the substrate is greater than another adhesion force between the patterned copper layer and the substrate.
Public/Granted literature
- US20210408053A1 ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-12-30
Information query
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